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Skip to search form Skip to main content You are currently offline. Some features of the site may not work correctly. DOI: Saitou Laser Mask Writers C. Yoshioka Conventional Optical Masks S. Rizvi Advanced Optical Masks W. Maurer and F. Kimmel and M. View via Publisher. Save to Library. Create Alert. Launch Research Feed. Share This Paper. Figures and Tables from this paper. Figures and Tables. Citations Publications citing this paper.
Spectroscopic ellipsometry applications in photomask technology Ron A. Synowicki , James N. Liftoff lithography of metals for extreme ultraviolet lithography mask absorber layer patterning Adam Lyons , Ranganath Teki , John G. Hartley Physics, Engineering Advanced Lithography References Publications referenced by this paper. Rice , Ralph C. Scanning electron microscope analog of scatterometry John S.
Lowney , Michael T. Is a production-level scanning electron microscope linewidth standard possible? Michael T. Introduction to analytical electron microscopy John J. Hren , Joseph I. Goldstein , David Joy Materials Science Scanning electron microscopy Patrick Echlin Chemistry Nature Postek, New way of handling dimensional measurement results for integrated circuit technology. SPIE, Photoresist modeling for nm and nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition Benjamen Michael Rathsack Materials Science Larrabee, Image sharpness measurement in scanning electron microscopy.
Handbook of photomask manufacturing technology
Handbook of Photomask Manufacturing Technology. As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development.
Handbook of Photomask Manufacturing Technology